报告题目：
Recent Advances in Chemical Process Modeling and Simulation Technology for Product and Process Development
报告人：
Aspen Technology, Inc.共同创始人、副总裁
Chau-Chyun Chen 博士
报告地点：玉泉校区高分子楼二楼会议室
时间：5月26日（周一）下午2:00
欢迎教师、学生参加！
浙江大学材料与化工学院
陈博士简介：Dr. Chau-Chyun Chen is a co-founder of Aspen Technology, Inc. He currently serves as a Vice President of Technology responsible for science and technology innovations in AspenTech’s Process Modeling business area. He is the inventor of three widely used activity coefficient models: electrolyte NRTL model, polymer NRTL model, and NRTL-SAC model for pharmaceuticals. He was the architect of AspenTech’s electrolyte modeling and polymer modeling capabilities. His recent focus areas include rate-based CO2 capture modeling, corrosion modeling, and pharmaceutical and biological product and process modeling.
A member of US National Academy of Engineering since 2005, Dr. Chen has published over 90 patents, journal articles and book chapters and presented over 120 papers in international conferences and universities. He is the recipient of the 2001 Computing Practice Award and the 1984 Ted Peterson Best Paper Award from CAST Division of AIChE. He received ScD and MS degrees in chemical engineering from the Massachusetts Institute of Technology and BS degree in chemistry from National Taiwan University.
